Global and United States Mask Defect Inspection Equipment Market Insights, Forecast to 2027

Global and United States Mask Defect Inspection Equipment Market Insights, Forecast to 2027

  • QYResearch
  • September 2021
  • Semiconductors
  • 131 pages

Report Description

Mask Defect Inspection Equipment is a pattern master used in photolithography in microelectronics manufacturing. An opaque light-shielding film is used to form a mask pattern on a transparent substrate, and the pattern is transferred to the product substrate through exposure.
Global Mask Defect Inspection Equipment key players include KLA-Tencor, Applied Materials, Lasertec, etc. Global top three manufacturers hold a share over 75%.
China is the largest market, with a share about 30%, followed by South Korea, and North America, both have a share over 30 percent.
In terms of product, Photomask Inspection Equipment is the largest segment, with a share over 85%. And in terms of application, the largest application is Semiconductor IC and Chip Manufacturer, followed by Photomask Factory, Substrate Manufacturer.

Market Analysis and Insights: Global and United States Mask Defect Inspection Equipment Market
This report focuses on global and United States Mask Defect Inspection Equipment market.
In 2020, the global Mask Defect Inspection Equipment market size was US$ 975 million and it is expected to reach US$ 1550.5 million by the end of 2027, with a CAGR of 6.5% during 2021-2027. In United States the Mask Defect Inspection Equipment market size is expected to grow from US$ XX million in 2020 to US$ XX million by 2027, at a CAGR of XX% during the forecast period.

Global Mask Defect Inspection Equipment Scope and Market Size
Mask Defect Inspection Equipment market is segmented by region (country), players, by Type, and by Application. Players, stakeholders, and other participants in the global Mask Defect Inspection Equipment market will be able to gain the upper hand as they use the report as a powerful resource. The segmental analysis focuses on revenue and forecast by region (country), by Type and by Application in terms of revenue and forecast for the period 2016-2027.
For United States market, this report focuses on the Mask Defect Inspection Equipment market size by players, by Type, and by Application, for the period 2016-2027. The key players include the global and local players which play important roles in United States.

Segment by Type
Photomask Inspection Equipment
Photomask Substrate Inspection Equipment

Segment by Application
Semiconductor IC and Chip Manufacturer
Photomask Factory
Substrate Manufacturer

By Region
North America
United States
Canada
Europe
Germany
France
U.K.
Italy
Russia
Asia-Pacific
China
Japan
South Korea
India
Australia
China Taiwan
Indonesia
Thailand
Malaysia
Latin America
Mexico
Brazil
Argentina
Middle East & Africa
Turkey
Saudi Arabia
UAE

By Company
KLA-Tencor
Applied Materials
Lasertec
NuFlare
Carl Zeiss AG
Advantest

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1 Study Coverage
1.1 Mask Defect Inspection Equipment Product Introduction
1.2 Market by Type
1.2.1 Global Mask Defect Inspection Equipment Market Size Growth Rate by Type
1.2.2 Photomask Inspection Equipment
List of Tables
Table 1. Global Mask Defect Inspection Equipment Market Size Growth Rate by Type, 2016 VS 2021 VS 2027 (US$ Million)
Table 2. Major Manufacturers of Photomask Inspection Equipment
Table 3. Major Manufacturers of Photomask Substrate Inspection Equipment
Table 4. Global Mask Defect Inspection Equipment Market Size Growth Rate by Application (2021-2027) & (Units)
Table 5. Global Mask Defect Inspection Equipment Market Size by Region (Units) & (US$ Million), 2016 VS 2021 VS 2027

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