Global and Japan Plasma Etch System for Wafer Processing Market Insights, Forecast to 2027
- November 2021
- 154 pages
For Japan market, this report focuses on the Plasma Etch System for Wafer Processing market size by players, by Type, and by Application, for the period 2016-2027. The key players include the global and local players which play important roles in Japan.
Segment by Type
Inductively Coupled Plasma (ICP)
Reactive Ion Etching (RIE)
Deep Reactive Ion Etching (DRIE)
Segment by Application
Electronics and Microelectronics
Middle East & Africa
SPTS Technologies (an Orbotech Company)
Plasma Etch, Inc.
Tokyo Electron Limited
Product Type & Applications
- Oxford Instruments
- Lam Research
- Applied Materials
- SPTS Technologies (an Orbotech Company)
- Trion Technology
- Plasma Etch System for Wafer Processing
- Electronics and Microelectronics
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1.1 Plasma Etch System for Wafer Processing Product Introduction
1.2 Market by Type
1.2.1 Global Plasma Etch System for Wafer Processing Market Size Growth Rate by Type
1.2.2 Inductively Coupled Plasma (ICP)
Table 1. Global Plasma Etch System for Wafer Processing Market Size Growth Rate by Type, 2016 VS 2021 VS 2027 (US$ Million)
Table 2. Major Manufacturers of Inductively Coupled Plasma (ICP)
Table 3. Major Manufacturers of Reactive Ion Etching (RIE)
Table 4. Major Manufacturers of Deep Reactive Ion Etching (DRIE)
Table 5. Global Plasma Etch System for Wafer Processing Market Size Growth Rate by Application (2021-2027) & (Units)
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